DocumentCode :
310864
Title :
Plasma Induced Charging Evaluation Using SCA And PDM Tools
Author :
Karzhavin, Yuri ; Lao, Keith ; Wu, Wei ; Gelatos, Carol
Author_Institution :
Motorola
fYear :
1997
fDate :
13-14 May 1997
Firstpage :
143
Lastpage :
146
Keywords :
Antenna measurements; Current measurement; Etching; Plasma applications; Plasma devices; Plasma materials processing; Plasma measurements; Plasma sources; Resists; Thickness measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
Type :
conf
DOI :
10.1109/PPID.1997.596722
Filename :
596722
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=310864
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