Title :
MERIE Metal Etcher Induced Device Degradation And Subsequent Magnetic Field Enhancement Characterization
Author :
Yu, Shaun T. ; Ku, S.M. ; Chiang, A.M. ; Shu, H.J. ; Chen, P.H. ; De Zaldivar, Jose Solo
Author_Institution :
Taiwan Semiconductor Manufacturing Corporation
Keywords :
Ambient intelligence; Degradation; Diodes; Etching; MOSFET circuits; Magnetic fields; Plasma measurements; Production; Protection; Testing;
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
DOI :
10.1109/PPID.1997.596726
