Title :
Characterization Of A Matrix 1178 Stripper System For Electrical Device Damage Using Statistical Modeling And SPIDER Wafers
Author :
Donoghue, Kevin ; Werking, Jim ; McCormack, D.W., Jr
Author_Institution :
Matrix Integrated Systemns, Inc.
Keywords :
Design for experiments; Etching; Optical device fabrication; Plasma devices; Plasma temperature; Production; Radio frequency; Resists; Semiconductor device modeling; Strips;
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
DOI :
10.1109/PPID.1997.596728
