• DocumentCode
    310868
  • Title

    Characterization Of A Matrix 1178 Stripper System For Electrical Device Damage Using Statistical Modeling And SPIDER Wafers

  • Author

    Donoghue, Kevin ; Werking, Jim ; McCormack, D.W., Jr

  • Author_Institution
    Matrix Integrated Systemns, Inc.
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    157
  • Lastpage
    160
  • Keywords
    Design for experiments; Etching; Optical device fabrication; Plasma devices; Plasma temperature; Production; Radio frequency; Resists; Semiconductor device modeling; Strips;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596728
  • Filename
    596728
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310868