DocumentCode

310871

Title

Reduction Of Charging Damage Through Substrate Potential Control

Author

Sakai, Itsuko ; Sekine, Makoto

Author_Institution

Toshiba Corp.

fYear

1997

fDate

13-14 May 1997

Firstpage

171

Lastpage

174

Keywords

Capacitors; Cathodes; Electrons; Magnetic field measurement; Magnetic fields; Magnetic flux; Plasma measurements; Polyimides; Substrates; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Process-Induced Damage, 1997., 2nd International Symposium on

Conference_Location

Monterey, California, USA

Print_ISBN

0-9651-5771-7

Type

conf

DOI

10.1109/PPID.1997.596732

Filename

596732