• DocumentCode
    310878
  • Title

    Fast-turnaround Plasma Charging Damage Monitor: Method And Application To A Metal Etch And Resist Strip Process

  • Author

    Werking, James ; Bersuker, Gennadi ; Chan, Y.David

  • Author_Institution
    SEMATECH
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    197
  • Lastpage
    200
  • Keywords
    Etching; Monitoring; Plasma applications; Plasma devices; Plasma immersion ion implantation; Plasma measurements; Plasma temperature; Resists; Stress; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596742
  • Filename
    596742
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310878