• DocumentCode
    310885
  • Title

    Dry Etching Damage In Pt/Pb(Zr, Ti)O3/Pt Capacitors Patterned By A Single Photolithography Process Step

  • Author

    Kumihashi, Takao ; Kawakami, Hiroshi ; Torii, Kentaro ; Suga, Mitsuo ; Kure, Tokuo

  • Author_Institution
    Hitachi Ltd.
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    221
  • Lastpage
    224
  • Keywords
    Amorphous materials; Area measurement; Argon; Capacitors; Dry etching; Leakage current; Lithography; Plasma applications; Radio frequency; Scanning electron microscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596752
  • Filename
    596752
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310885