• DocumentCode
    310892
  • Title

    A Model For Photoresist-induced Charging Damage In Ultra-thin Gate Oxides

  • Author

    Lin, Horng-Chih ; Chien, Chao-Hsing ; Wang, Meng-Feng ; Huang, Tiao-Yuan ; Chang, Chun-Yen

  • Author_Institution
    National Chiao-Tung University
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    247
  • Lastpage
    250
  • Keywords
    Chaos; Plasma applications; Plasma devices; Plasma immersion ion implantation; Plasma materials processing; Plasma sources; Plasma temperature; Resists; Testing; Wet etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596761
  • Filename
    596761
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310892