Studies Of Plasma Uniformity And Global Wafer Charging In A High Density, Inductively Coupled Metal Etcher

Author

Patrick, Roger ; Jones, Phillip ; En, William

Author_Institution

Lam Research Corporation

fYear

1997

fDate

13-14 May 1997

Firstpage

255

Lastpage

258

Keywords

Argon; Coils; Current measurement; EPROM; Plasma density; Plasma devices; Plasma measurements; Surface charging; Voltage measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Process-Induced Damage, 1997., 2nd International Symposium on

Conference_Location

Monterey, California, USA

Print_ISBN

0-9651-5771-7

Type

DOI

10.1109/PPID.1997.596765

Filename

596765

Link To Document