Title :
Effect of As2 and As4 fluxes on the morphology of GaSb(001) surface during growth of GaSb/InAs heterojunction by MBE
Author :
Emelyanov, Eugene A. ; Putyato, Mikhail A. ; Semyagin, Boris R. ; Vasilenko, A. ; Feklin, D. ; Vasev, Andrey V. ; Preobrazhenskii, Valery V.
Author_Institution :
A.V. Rzhanov Inst. of Semicond. Phys., SB RAS, Novosibirsk, Russia
fDate :
June 30 2011-July 4 2011
Abstract :
Interaction of GaSb(001) surface with fluxes of As2, As4 and Sb4 molecules was investigated on the basis of the reflection high energy electron diffraction (RHEED) method. Exposure of GaSb surface to As2 and As4 fluxes results in substitution of antimony atoms by arsenic atoms. It is shown that As2 molecules interact with GaSb surface mostly on the basis of the direct substitution mechanism, while As4 molecules interact with it on the basis of the vacancy mechanism. It has been found that for reproducible generation of In-Sb heteroboundaries in InAs/GaSb super-lattices it is necessary to use As4 flux rather than As2 one. The research results have allowed optimizing the technology for growth of short-period InAs/GaSb superlattices that have high potential for development of IR photodetectors.
Keywords :
III-V semiconductors; gallium compounds; indium compounds; infrared detectors; molecular beam epitaxial growth; photodetectors; reflection high energy electron diffraction; semiconductor growth; semiconductor heterojunctions; semiconductor superlattices; surface morphology; GaSb; GaSb-InAs; IR photodetectors; RHEED method; direct substitution mechanism; molecular-beam epitaxy; reflection high energy electron diffraction method; superlattices; surface morphology; vacancy mechanism; Atomic layer deposition; Molecular beam epitaxial growth; Morphology; Physics; Superlattices; Surface morphology; Surface treatment; Molecular-beam epitaxy; RHEED; arsenic molecular form; photodetector; short-period superlattice;
Conference_Titel :
Micro/Nanotechnologies and Electron Devices (EDM), 2011 International Conference and Seminar of Young Specialists on
Conference_Location :
Erlagol, Altai
Print_ISBN :
978-1-61284-793-1
DOI :
10.1109/EDM.2011.6006888