Title :
2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432)
Abstract :
The following topics were discussed: processing and devices; implantation damage; annealing; modelling and simulation; SOI technology; implanter systems and components; low energy large area implantation; ion sources; charging; process control; contamination; safety and environmental effects; nonsemiconductor applications
Keywords :
ion implantation; semiconductor doping; SOI technology; annealing; contamination; implantation damage; implanter systems; ion sources; low energy large area implantation; nonsemiconductor implantation; process control; semiconductor doping;
Conference_Titel :
Ion Implantation Technology, 2000. Conference on
Conference_Location :
Alpbach
Print_ISBN :
0-7803-6462-7
DOI :
10.1109/IIT.2000.924078
