DocumentCode :
3112171
Title :
A personal historical perspective of ion implantation equipment for semiconductor applications
Author :
Mckenna, Charles M.
fYear :
2000
fDate :
2000
Firstpage :
1
Lastpage :
19
Abstract :
This chapter is a personal rumination on the various factors that spawned and influenced the commercial ion implantation equipment business over the last thirty years. In particular, the details of several high current implanters developed internally at Western Electric, IBM and Hughes are recounted. Also, certain recurring factors will be correlated with the relative success of certain products and product types. As this is all considered from a uniquely singular perspective, the author apologizes in advance for any errors of omission or commission relative to the official historical record
Keywords :
history; ion implantation; Hughes; IBM; Western Electric; commercial ion implantation equipment business; high current implanters; historical review; semiconductor applications; Business; Electrostatics; Europe; Ion accelerators; Ion beams; Ion implantation; Laboratories; Nuclear physics; Nuclear power generation; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ion Implantation Technology, 2000. Conference on
Conference_Location :
Alpbach
Print_ISBN :
0-7803-6462-7
Type :
conf
DOI :
10.1109/.2000.924079
Filename :
924079
Link To Document :
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