• DocumentCode
    3112377
  • Title

    Observation of birefringence distribution caused by residual strain in bulk c-plane GaN substrates

  • Author

    Fukuzawa, M. ; Kashiwagi, R. ; Yamada, M.

  • Author_Institution
    Graduation Sch. of Sci. & Technol., Kyoto Inst. of Technol., Kyoto, Japan
  • fYear
    2010
  • fDate
    May 31 2010-June 4 2010
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    Strain-induced birefringence has been observed in bulk c-plane GaN substrates. Two-dimensional distribution of index ellipse difference |Δn| revealed a variety of distribution such as gradual U-shape distribution with rotational symmetry and chord- and spot-like patterns with three- and/or six-fold symmetries reflecting the whole manufacturing process of substrates. Although the absolute value of the strain is not obtained yet, because of unknown photoelastic constants, the |Δn| map is useful for qualitative evaluation of strain distribution over the whole substrate.
  • Keywords
    III-V semiconductors; birefringence; gallium compounds; photoelasticity; substrates; wide band gap semiconductors; GaN; bulk c-plane GaN substrates; gradual U-shape distribution; index ellipse difference; photoelastic constants; strain-induced birefringence; Birefringence; Capacitive sensors; Fluctuations; Gallium nitride; Optical polarization; Strain measurement; Substrates; Thermal expansion; Thermal stresses; Thick films; GaN; birefringence; bulk substrate; polariscope; residual strain;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide & Related Materials (IPRM), 2010 International Conference on
  • Conference_Location
    Kagawa
  • ISSN
    1092-8669
  • Print_ISBN
    978-1-4244-5919-3
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2010.5516031
  • Filename
    5516031