DocumentCode
3112377
Title
Observation of birefringence distribution caused by residual strain in bulk c-plane GaN substrates
Author
Fukuzawa, M. ; Kashiwagi, R. ; Yamada, M.
Author_Institution
Graduation Sch. of Sci. & Technol., Kyoto Inst. of Technol., Kyoto, Japan
fYear
2010
fDate
May 31 2010-June 4 2010
Firstpage
1
Lastpage
3
Abstract
Strain-induced birefringence has been observed in bulk c-plane GaN substrates. Two-dimensional distribution of index ellipse difference |Δn| revealed a variety of distribution such as gradual U-shape distribution with rotational symmetry and chord- and spot-like patterns with three- and/or six-fold symmetries reflecting the whole manufacturing process of substrates. Although the absolute value of the strain is not obtained yet, because of unknown photoelastic constants, the |Δn| map is useful for qualitative evaluation of strain distribution over the whole substrate.
Keywords
III-V semiconductors; birefringence; gallium compounds; photoelasticity; substrates; wide band gap semiconductors; GaN; bulk c-plane GaN substrates; gradual U-shape distribution; index ellipse difference; photoelastic constants; strain-induced birefringence; Birefringence; Capacitive sensors; Fluctuations; Gallium nitride; Optical polarization; Strain measurement; Substrates; Thermal expansion; Thermal stresses; Thick films; GaN; birefringence; bulk substrate; polariscope; residual strain;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide & Related Materials (IPRM), 2010 International Conference on
Conference_Location
Kagawa
ISSN
1092-8669
Print_ISBN
978-1-4244-5919-3
Type
conf
DOI
10.1109/ICIPRM.2010.5516031
Filename
5516031
Link To Document