DocumentCode :
3112660
Title :
Nonlinear Control Design for a Plasma Process
Author :
Iordanov, Petar ; Ringwood, John ; Doherty, Seán
Author_Institution :
Department of Electronic Engineering, National University of Ireland at Maynooth, Maynooth, Republic of Ireland. petar.iordanov@eeng.nuim.ie
fYear :
2005
fDate :
12-15 Dec. 2005
Firstpage :
2380
Lastpage :
2385
Abstract :
This paper presents a nonlinear control design for a first-principles based model of an argon plasma process. In this study, a Hammerstein-type structure was employed as a basis for a feedback control design. Artificial neural networks were used to accurately model the static nonlinearity. In the developed Hammerstein model, variations in the process dynamics were accounted for by considering parametric uncertainty. A control design strategy based on μ-synthesis was applied to deliver good tracking performance and disturbance rejection.
Keywords :
Chemical processes; Control design; Etching; Geometry; Plasma applications; Plasma chemistry; Plasma measurements; Plasma properties; Power system modeling; Uncertainty;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Decision and Control, 2005 and 2005 European Control Conference. CDC-ECC '05. 44th IEEE Conference on
Print_ISBN :
0-7803-9567-0
Type :
conf
DOI :
10.1109/CDC.2005.1582518
Filename :
1582518
Link To Document :
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