Title :
Manufacturing science in ion implantation
Author :
Glawischnig, Hans
Author_Institution :
Infineon Technol., Dresden, Germany
Abstract :
The paper demonstrates possibilities to improve the overall equipment effectiveness (OEE) for ion implantation equipment in terms of throughput and cycle time. Procedures for automated data collection are presented, along with a description of the underlying models for static and dynamic throughput, strategies to implement these partly conflicting requirements, and guidelines for an automated dispatch management
Keywords :
dispatching; ion implantation; manufacturing data processing; manufacturing processes; semiconductor process modelling; automated data collection; automated dispatch management; cycle time; dynamic throughput; ion implantation; ion implantation equipment; ion implantation technology; manufacturing science; overall equipment effectiveness; static throughput; Automatic control; Communication system control; Ion implantation; Manufacturing automation; Manufacturing processes; Productivity; Semiconductor device manufacture; Semiconductor devices; Space technology; Throughput;
Conference_Titel :
Ion Implantation Technology, 2000. Conference on
Conference_Location :
Alpbach
Print_ISBN :
0-7803-6462-7
DOI :
10.1109/.2000.924161
