DocumentCode
3113802
Title
Manufacturing science in ion implantation
Author
Glawischnig, Hans
Author_Institution
Infineon Technol., Dresden, Germany
fYear
2000
fDate
2000
Firstpage
354
Lastpage
359
Abstract
The paper demonstrates possibilities to improve the overall equipment effectiveness (OEE) for ion implantation equipment in terms of throughput and cycle time. Procedures for automated data collection are presented, along with a description of the underlying models for static and dynamic throughput, strategies to implement these partly conflicting requirements, and guidelines for an automated dispatch management
Keywords
dispatching; ion implantation; manufacturing data processing; manufacturing processes; semiconductor process modelling; automated data collection; automated dispatch management; cycle time; dynamic throughput; ion implantation; ion implantation equipment; ion implantation technology; manufacturing science; overall equipment effectiveness; static throughput; Automatic control; Communication system control; Ion implantation; Manufacturing automation; Manufacturing processes; Productivity; Semiconductor device manufacture; Semiconductor devices; Space technology; Throughput;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology, 2000. Conference on
Conference_Location
Alpbach
Print_ISBN
0-7803-6462-7
Type
conf
DOI
10.1109/.2000.924161
Filename
924161
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