• DocumentCode
    3114109
  • Title

    Energy enhancement on NV-GSD-HE

  • Author

    Kariya, Hiroyuki ; Inada, Kouji ; Tsukihara, Mitsukuni ; Sugitani, Michiro ; Murakami, Yoshinobu

  • Author_Institution
    Sumitomo Eaton Nova Corp., Ehime, Japan
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    407
  • Lastpage
    410
  • Abstract
    Higher energy boron implantation has been being required for CCD application on the NV-GSD-HE (HE). The HE LINAC acceleration system has characteristics that acceleration efficiency is dependent on a mass-to-charge ratio of ions to be accelerated. The maximum energy of boron is 2.3 MeV while that of phosphorus is 3.0 MeV since the original HE was designed to maximize the acceleration efficiency for singly charged phosphorus, while that for multiply charged boron is relatively poorer. New configuration of RF acceleration on the HE has been developed in order to increase the maximum energy of boron. On this configuration newly designed RF electrodes and electrostatic quadrupole lenses optimized for small mass-to-charge ratio ions are introduced, replacing the original electrodes and quadrupole lenses. As a result, the maximum energy of triply charged boron is increased up to 2.94 MeV and the maximum energy of doubly charged phosphorus is 2.6 MeV. Therefore, the newly configured tool can be used both for the CCD application and the well formation, including the triple well
  • Keywords
    beam handling equipment; boron; electrostatic lenses; ion implantation; ion optics; particle beam diagnostics; phosphorus; 2.3 to 3 MeV; B; HE LINAC acceleration system; NV-GSD-HE ion implanter; P; RF electrodes; acceleration efficiency; boron implantation; electrodes; electrostatic quadrupole lenses; energy enhancement; mass-to-charge ratio; multiply charged boron; quadrupole lenses; singly charged phosphorus; triple well; triply charged boron; Acceleration; Boron; Charge coupled devices; Electrodes; Electrostatics; Helium; Lenses; Linear particle accelerator; Optical design; Radio frequency;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ion Implantation Technology, 2000. Conference on
  • Conference_Location
    Alpbach
  • Print_ISBN
    0-7803-6462-7
  • Type

    conf

  • DOI
    10.1109/.2000.924174
  • Filename
    924174