DocumentCode
3114109
Title
Energy enhancement on NV-GSD-HE
Author
Kariya, Hiroyuki ; Inada, Kouji ; Tsukihara, Mitsukuni ; Sugitani, Michiro ; Murakami, Yoshinobu
Author_Institution
Sumitomo Eaton Nova Corp., Ehime, Japan
fYear
2000
fDate
2000
Firstpage
407
Lastpage
410
Abstract
Higher energy boron implantation has been being required for CCD application on the NV-GSD-HE (HE). The HE LINAC acceleration system has characteristics that acceleration efficiency is dependent on a mass-to-charge ratio of ions to be accelerated. The maximum energy of boron is 2.3 MeV while that of phosphorus is 3.0 MeV since the original HE was designed to maximize the acceleration efficiency for singly charged phosphorus, while that for multiply charged boron is relatively poorer. New configuration of RF acceleration on the HE has been developed in order to increase the maximum energy of boron. On this configuration newly designed RF electrodes and electrostatic quadrupole lenses optimized for small mass-to-charge ratio ions are introduced, replacing the original electrodes and quadrupole lenses. As a result, the maximum energy of triply charged boron is increased up to 2.94 MeV and the maximum energy of doubly charged phosphorus is 2.6 MeV. Therefore, the newly configured tool can be used both for the CCD application and the well formation, including the triple well
Keywords
beam handling equipment; boron; electrostatic lenses; ion implantation; ion optics; particle beam diagnostics; phosphorus; 2.3 to 3 MeV; B; HE LINAC acceleration system; NV-GSD-HE ion implanter; P; RF electrodes; acceleration efficiency; boron implantation; electrodes; electrostatic quadrupole lenses; energy enhancement; mass-to-charge ratio; multiply charged boron; quadrupole lenses; singly charged phosphorus; triple well; triply charged boron; Acceleration; Boron; Charge coupled devices; Electrodes; Electrostatics; Helium; Lenses; Linear particle accelerator; Optical design; Radio frequency;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology, 2000. Conference on
Conference_Location
Alpbach
Print_ISBN
0-7803-6462-7
Type
conf
DOI
10.1109/.2000.924174
Filename
924174
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