Title :
Beam autotuning on the VIISta 810 ion implanter
Author :
Cucchetti, A. ; Distaso, D. ; Mollica, R. ; Olson, J.C. ; Renau, A. ; Scheuer, J.T. ; Smatlak, D.L.
Author_Institution :
Varian Semicond. Equip. Assoc. Inc., Gloucester, MA, USA
Abstract :
An innovative beam tuning algorithm has been developed for the VIISta 810 200/300 mm medium current implanter resulting in decreased tuning times and increased wafer throughput. Pre-calibrated magnets and a recipe-configurable tuning sequence are at the heart of the tuning improvements. An automated magnet calibration sequence is performed at the factory. Information from this pre-calibration is utilized during each beam setup to eliminate or greatly reduce the range of magnet tuning, having a positive impact on tuning times as well as decreasing particle generation. In this paper the automated magnet calibration procedure will be described and the effect of precalibrating the magnets on setup time will be discussed. The main features of recipe-configurable tuning such as customized tuning windows and changeable tuning sequence will be described. Data on the gas-to-gas and gas-to-solid setup times will also be presented
Keywords :
calibration; ion implantation; semiconductor doping; VIISta 810 ion implanter; automated magnet calibration sequence; beam autotuning; beam tuning algorithm; changeable tuning sequence; customized tuning windows; gas-to-gas setup times; gas-to-solid setup times; magnet tuning; particle generation; pre-calibrated magnets; recipe-configurable tuning sequence; tuning times; wafer throughput; Calibration; Delay; Heart; Ion beams; Magnetic fields; Magnets; Particle beams; Production facilities; Stability; Throughput;
Conference_Titel :
Ion Implantation Technology, 2000. Conference on
Conference_Location :
Alpbach
Print_ISBN :
0-7803-6462-7
DOI :
10.1109/.2000.924185
