• DocumentCode
    3114425
  • Title

    Characterization of InAlAs/In0.25Ga0.75As0.72Sb0.28/InGaAs double heterojunction bipolar transistors

  • Author

    Chang, Chao-Min ; Chen, Shu-Han ; Wang, Sheng-Yu ; Chyi, Jen-Inn

  • Author_Institution
    Dept. of Electr. Eng., Nat. Central Univ., Jhongli, Taiwan
  • fYear
    2010
  • fDate
    May 31 2010-June 4 2010
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    We report on the characterization of InP-based heterojunction bipolar transistors (HBTs) with low turn-on voltage and high current gain by using InGaAsSb as the base layer. The low turn-on voltage of 0.43 V is attributed to the smaller band gap of the In0.25Ga0.75As072Sb0.28 material. High current gain of 74 is observed despite a heavily Be-doped (9.0×1019 cm-3) base is used, suggesting a long minority carrier lifetime (τn) in the InGaAsSb material. Moreover, low specific contact resistivity of 5×10-8 Ω-cm2 is also demonstrated on separate In0.25Ga0.75As072Sb0.28 samples.
  • Keywords
    aluminium compounds; gallium arsenide; heterojunction bipolar transistors; indium compounds; HBT; InAlAs-In0.25Ga0.75As0.72Sb0.28-InGaAs; InP; double heterojunction bipolar transistors; voltage 0.43 V; Composite materials; Double heterojunction bipolar transistors; Electron emission; Indium compounds; Indium gallium arsenide; Indium phosphide; Low voltage; Molecular beam epitaxial growth; Photonic band gap; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide & Related Materials (IPRM), 2010 International Conference on
  • Conference_Location
    Kagawa
  • ISSN
    1092-8669
  • Print_ISBN
    978-1-4244-5919-3
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2010.5516128
  • Filename
    5516128