DocumentCode :
311485
Title :
Commercialisation of InP based epitaxy: state of the art and beyond!
Author :
Bland, S.W. ; Davies, J.I. ; Nelson, A.W. ; Rees, P.K. ; Scott, M.D.
Author_Institution :
Epitaxial Products International Ltd., Cardiff, UK
fYear :
1997
fDate :
11-15 May 1997
Firstpage :
539
Abstract :
Summary form only given. Over the last decade, InP technology and its related Materials have grown enormously in strategic importance as the technology has facilitated the explosive growth in optical fibre telecommunications, which in turn has spawned a huge communications revolution. In addition, InP based materials have been exploited for many other applications such as long wavelength IR detector arrays, gas sensing applications, imaging, solar cells, high speed HEMT and HBTs, high power FETs and several other mm and microwave devices
Keywords :
III-V semiconductors; indium compounds; semiconductor epitaxial layers; semiconductor growth; InP; InP technology; commercialisation; epitaxy; optical fibre telecommunication; state of the art; Epitaxial growth; Explosives; Indium phosphide; Infrared detectors; Microwave antenna arrays; Microwave communication; Microwave imaging; Optical fibers; Optical materials; Sensor arrays;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1997., International Conference on
Conference_Location :
Cape Cod, MA
ISSN :
1092-8669
Print_ISBN :
0-7803-3898-7
Type :
conf
DOI :
10.1109/ICIPRM.1997.600222
Filename :
600222
Link To Document :
بازگشت