Characterization of charging damage in high power implants using SPIDER wafers

Author

Singh, Bhanu ; Elkind, Alexander ; Mack, Michael ; Ameen, Michael ; Marshall, David ; Ring, Phil ; Krull, Wade

Author_Institution

Motorola Inc., Chandler, AZ, USA

fYear

2000

fDate

2000

Firstpage

561

Lastpage

564

Abstract

A detailed investigation of charging induced damage due to high power implants was done using SEMATECH SPIDER wafers with sub-50 Å gate oxide thickness. The SPIDER wafers have an active area to gate antenna ratio of up to 1:90 K, which enables a high sensitivity for charging related damage, Threshold voltage (V_t) and gate leakage current (I_g) shifts for both n- and p-type devices have been examined as a response to plasma electron flood (PEF) conditions. Results from 180 keV As⁺ and P⁺ implants at 20 mA and 5×10¹⁵/cm² dose are presented. The impact of PEF settings on n-mos and p-mos devices is shown, and correlated to both in situ charge monitors and CHARM wafers. This work underscores the importance of characterizing PEF operation to obtain optimum charge control

Keywords

MOSFET; arsenic; electron-surface impact; ion implantation; leakage currents; phosphorus; plasma materials processing; process control; semiconductor device measurement; semiconductor device testing; semiconductor doping; surface charging; 180 keV; 20 mA; 50 A; As⁺ implants; CHARM wafers; P⁺ implants; SEMATECH SPIDER wafers; SPIDER wafers; charging damage; charging induced damage; gate antenna ratio; gate leakage current; gate oxide; high power implants; high sensitivity; n-mos devices; n-type devices; optimum charge control; p-mos devices; p-type devices; plasma electron flood conditions; threshold voltage; CMOS technology; Electrodes; Electrons; Floods; Implants; Leakage current; MOSFETs; Plasma density; Plasma temperature; Threshold voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Ion Implantation Technology, 2000. Conference on

Conference_Location

Alpbach

Print_ISBN

0-7803-6462-7

Type

conf

DOI

10.1109/.2000.924214

Filename

924214