DocumentCode :
3115592
Title :
Vacuum actuated gas delivery
Author :
Olander, W. Karl ; Donatucci, Matt ; Mayer, Jim ; Wang, Luping
Author_Institution :
ATMI Inc., Danbury, CT, USA
fYear :
2000
fDate :
2000
Firstpage :
722
Lastpage :
725
Abstract :
The new Vacuum Actuated Cylinder (VACTM) gas source provides sub-atmospheric pressure delivery of the metal fluorides commonly used as dopants for ion implant. The VAC gas source is a mechanical system based on an embedded pressure control device located inside the cylinder. A pre-set sub-atmospheric pressure must be achieved in the delivery manifold before flow is permitted from the cylinder. Even with the primary cylinder valve open, if the threshold activation pressure is not achieved, flow does not occur. This paper describes the VAC gas source technology, its operation and features that include improved safety and storage capacity. A detailed discussion of the testing procedures, results and future plans is also included
Keywords :
flow control; gases; ion implantation; pressure control; safety; vacuum techniques; VAC gas source; Vacuum Actuated Cylinder gas source; delivery manifold; dopants; embedded pressure control device; ion implant; metal fluorides; pre-set sub-atmospheric pressure; primary cylinder valve; safety; storage capacity; sub-atmospheric pressure delivery; testing procedures; threshold activation pressure; vacuum actuated gas delivery; Assembly; Bellows; Fluid flow; Gases; Implants; Pressure control; Regulators; Safety; Testing; Valves;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ion Implantation Technology, 2000. Conference on
Conference_Location :
Alpbach
Print_ISBN :
0-7803-6462-7
Type :
conf
DOI :
10.1109/.2000.924255
Filename :
924255
Link To Document :
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