DocumentCode :
3118604
Title :
Challenges of RF and mixed signal design under process variability
Author :
Panagopoulos, Georgios ; Riess, Phillipp ; Baumgartner, Philip
Author_Institution :
Intel Corp., Munich, Germany
fYear :
2013
fDate :
8-10 July 2013
Firstpage :
251
Lastpage :
251
Abstract :
Summary form only given. The continuous device shrinking, towards nano-scaled technology nodes, has been resulted in yield and reliability challenges due to technology process variations for active FEOL devices and passives in the BEOL. These effects have been modelled extensively in terms of global and local variations. However, a lot of challenges remain to capture the medium range mismatch of these devices. This presentation will give some examples of RF and mixed signal circuits such as LNAs, PAs and VCOs where their performance is degraded due to this additional variability.
Keywords :
integrated circuit design; low noise amplifiers; mixed analogue-digital integrated circuits; nanotechnology; power amplifiers; radiofrequency integrated circuits; voltage-controlled oscillators; BEOL; LNA; PA; RF signal circuits; VCO; active FEOL devices; continuous device shrinking; global variations; local variations; mixed signal circuits; nanoscaled technology nodes; passive devices; process variability; technology process variations; Integrated circuit modeling; Nanoscale devices; Performance evaluation; Radio frequency; Reliability engineering; Signal design;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
On-Line Testing Symposium (IOLTS), 2013 IEEE 19th International
Conference_Location :
Chania
Type :
conf
DOI :
10.1109/IOLTS.2013.6604095
Filename :
6604095
Link To Document :
بازگشت