Title :
A single-crystal silicon 3-axis CMOS-MEMS accelerometer
Author :
Qu, Hongwei ; Fang, Deyou ; Xie, Huikai
Author_Institution :
Dept. of Electr. & Comput. Eng., Florida Univ., Gainesville, FL, USA
Abstract :
The paper presents a single-crystal silicon (SCS)-based, integrated 3-axis accelerometer fabricated using a post-CMOS micromachining process. This new CMOS-MEMS process provides monolithic integration of electronics and SCS microstructures, and electrical isolation of silicon. By employing a unique vertical sensing mechanism, 3-axis acceleration sensing is achieved with a single proof mass. The symmetric structures and fully differential configuration of all the sensing electrodes can greatly reduce the cross coupling among the 3 axes. By sacrificing one interconnect metal layer, the silicon undercut of the sensing comb fingers is minimized, resulting in much higher sensitivity with the same device footprint. A wet Al etching process was also developed to remove the top Al layer without attacking the Al layers exposed from the sidewalls of the multilayer Al/oxide stacks. A two-stage, open-loop, continuous time chopper stabilized amplifier is integrated on the chip.
Keywords :
CMOS integrated circuits; accelerometers; aluminium; amplifiers; etching; micromachining; microsensors; monolithic integrated circuits; silicon; 3-axis CMOS-MEMS accelerometer; Al; Si; continuous time chopper stabilized amplifier; cross coupling; electrical isolation; monolithic integration; multilayer stacks; post-CMOS micromachining process; proof mass; sensing comb fingers; sensing electrodes differential configuration; single-crystal silicon; vertical sensing mechanism; wet aluminium etching process; Acceleration; Accelerometers; Electrodes; Fingers; Micromachining; Microstructure; Monolithic integrated circuits; Nonhomogeneous media; Silicon; Wet etching;
Conference_Titel :
Sensors, 2004. Proceedings of IEEE
Print_ISBN :
0-7803-8692-2
DOI :
10.1109/ICSENS.2004.1426253