DocumentCode :
3120835
Title :
Matching of HDP-chambers using golden tool methodology & VDS measurement tool
Author :
Hoyer, Gunther
Author_Institution :
Infineon Technol., Dresden, Germany
fYear :
2004
fDate :
4-6 May 2004
Firstpage :
199
Lastpage :
204
Abstract :
This Poster describes a procedure to improve the manufacturing performance of HDP-chambers. A group of maintenance and process engineers from the Infineon CVD organization and the equipment service from the tool manufacturer developed this method to minimize extreme yield losses because of differences in the chamber performance of identical chambers.
Keywords :
integrated circuit manufacture; integrated circuit yield; plasma CVD; vacuum apparatus; voids (solid); Infineon CVD organization; golden tool methodology; high density plasma chambers; tool manufacturer; vacuum diagnostic system; Ceramics; Electronic switching systems; Hardware; Loss measurement; Minimization methods; Performance loss; Plasma sources; Plasma temperature; Production; Temperature control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing, 2004. ASMC '04. IEEE Conference and Workshop
Print_ISBN :
0-7803-8312-5
Type :
conf
DOI :
10.1109/ASMC.2004.1309565
Filename :
1309565
Link To Document :
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