DocumentCode
3120835
Title
Matching of HDP-chambers using golden tool methodology & VDS measurement tool
Author
Hoyer, Gunther
Author_Institution
Infineon Technol., Dresden, Germany
fYear
2004
fDate
4-6 May 2004
Firstpage
199
Lastpage
204
Abstract
This Poster describes a procedure to improve the manufacturing performance of HDP-chambers. A group of maintenance and process engineers from the Infineon CVD organization and the equipment service from the tool manufacturer developed this method to minimize extreme yield losses because of differences in the chamber performance of identical chambers.
Keywords
integrated circuit manufacture; integrated circuit yield; plasma CVD; vacuum apparatus; voids (solid); Infineon CVD organization; golden tool methodology; high density plasma chambers; tool manufacturer; vacuum diagnostic system; Ceramics; Electronic switching systems; Hardware; Loss measurement; Minimization methods; Performance loss; Plasma sources; Plasma temperature; Production; Temperature control;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing, 2004. ASMC '04. IEEE Conference and Workshop
Print_ISBN
0-7803-8312-5
Type
conf
DOI
10.1109/ASMC.2004.1309565
Filename
1309565
Link To Document