Title :
Analysis of wafer process duration for ab initio calculation of capacity, throughput and bottleneck equipments in a wafer fab
Author :
Etzel, H. ; Staudt, P. ; Oertel, J. ; Dudde, R.
Author_Institution :
Flensburg Univ. of Appl. Sci., Germany
Abstract :
The production flow in a mid sized state of the art wafer fab has been used for the statistical analysis. In this paper, we report on an evaluation of wafer booking times for an analysis of equipment utilization and wafer fab capacity which turned out to be an easy tool to provide actual information on process steps and overall fab utilization and capacity.
Keywords :
ab initio calculations; cleaning; electronics industry; flow shop scheduling; integrated circuit manufacture; production engineering computing; semiconductor technology; ab initio calculation; bottleneck equipments; equipment utilization; fab capacity; porcess steps; production flow; wafer process duration; Conductors; Data mining; Flow production systems; Information analysis; MOSFETs; Manufacturing automation; Production control; Silicon; Software packages; Throughput;
Conference_Titel :
Advanced Semiconductor Manufacturing, 2004. ASMC '04. IEEE Conference and Workshop
Print_ISBN :
0-7803-8312-5
DOI :
10.1109/ASMC.2004.1309591
