Temperature stability of exchange bias field and magnetoresistance of permalloy layer in Fe20Ni80/Tb-Co films

Author

Kulesh, N. ; Balymov, K.G. ; Adanakova, O.A. ; Vas´Kovskiy, V.O.

Author_Institution

Ural Fed. Univ., Yekaterinburg, Russia

fYear

2015

fDate

11-15 May 2015

Firstpage

1

Lastpage

1

Abstract

The temperature stability of exchange bias field and anisotropic magnetoresistance of permalloy layer in Fe₂₀Ni₈₀/Tb-Co films is studied. The samples are deposited via high-frequency ion sputtering and annealed in a vacuum chamber. X-ray fluorescence spectrometry is used for elemental composition analysis. Magnetization, magnetic anisotropy, and magnetoresistive properties are measured using SQUID magnetometry and VSM.

Keywords

Permalloy; SQUID magnetometry; X-ray fluorescence analysis; cobalt alloys; enhanced magnetoresistance; exchange interactions (electron); interface magnetism; magnetic anisotropy; magnetic thin films; metallic thin films; sputter deposition; terbium alloys; Fe₂₀Ni₈₀-TbCo; SQUID magnetometry; VSM; X-ray fluorescence spectrometry; anisotropic magnetoresistance; annealing; elemental composition analysis; exchange bias field; high-frequency ion sputtering; magnetic anisotropy; magnetization; permalloy; temperature stability; vacuum chamber; Films; Magnetic anisotropy; Magnetic field measurement; Magnetic fields; Magnetic hysteresis; Temperature dependence; Temperature measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Magnetics Conference (INTERMAG), 2015 IEEE

Conference_Location

Beijing

Print_ISBN

978-1-4799-7321-7

Type

conf

DOI

10.1109/INTMAG.2015.7156578

Filename

7156578