Optical observation of gas jet z-pinch discharge produced extreme ultraviolet light source

A high repetitive, compact and low-debris Xenon Z-pinch discharge system has been designed and fabricated as an EUV light source, in which a newly developed gas jet-type Z-pinch source is used. The discharge head has a coaxial double nozzle and diffuser. Xenon Z-pinch plasma that emits EUV light is produced between the inner nozzle and the corresponding diffuser. An annular shell of a He gas curtain produced by the outer nozzle is specially designed for shielding the debris and suppressing the inner gas expansion. In present study, effect of gas curtain was optically measured using x-ray pinhole camera system. In order to get high-output EUV, a new pulse supply system and a new preionization system using RF discharge have been developed and tested. This circuit delivers a current with amplitude of 22 kA, rise time of 110 ns and pulse duration of 260 ns to a short circuit load.