DocumentCode
3121671
Title
Investigation of resistive switching properties in Sm2 O3 memory devices
Author
Huang, Sheng-Yao ; Chang, Ting-Chang ; Chen, Min-Chen ; Sze, Simon M. ; Tsai, Ming-Jinn
Author_Institution
Dept. of Phys., Nat. Sun Yat-Sen Univ., Kaohsiung, Taiwan
fYear
2011
fDate
7-9 Nov. 2011
Firstpage
1
Lastpage
3
Abstract
The resistance switching behavior has been reported in various materials, including perovskite oxides, transition metal oxides, organics, etc. Among these materials, it is interesting to investigate the RRAMs device based on high-k materials, which are appropriate to integration with CMOS process in the future. Samarium oxide (Sm2O3) is one of important rare earth oxide materials. It has been investigated as high-k materials to substitute SiO2 in CMOS device. Hence, this study investigates a sputtered Sm2O3 thin film to apply into a resistive random access memory device. The proposed device exhibits a stable resistance ratio after 104 cycling bias pulses and no degradation for retention characteristics monitored after an endurance test at 30°C.
Keywords
CMOS memory circuits; high-k dielectric thin films; random-access storage; samarium compounds; switching circuits; CMOS process; RRAM device; Sm2O3; high-k materials; memory devices; perovskite oxides; rare earth oxide materials; resistive random access memory device; resistive switching property; sputtered thin film; temperature 30 degC; transition metal oxides; Films; High K dielectric materials; Ions; Resistance; Switches; Tin; RRAM; Sm2 O3 thin film; nonvolatile memory; resistance switching;
fLanguage
English
Publisher
ieee
Conference_Titel
Non-Volatile Memory Technology Symposium (NVMTS), 2011 11th Annual
Conference_Location
Shanghai
Print_ISBN
978-1-4577-1428-3
Type
conf
DOI
10.1109/NVMTS.2011.6137094
Filename
6137094
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