• DocumentCode
    3121671
  • Title

    Investigation of resistive switching properties in Sm2O3 memory devices

  • Author

    Huang, Sheng-Yao ; Chang, Ting-Chang ; Chen, Min-Chen ; Sze, Simon M. ; Tsai, Ming-Jinn

  • Author_Institution
    Dept. of Phys., Nat. Sun Yat-Sen Univ., Kaohsiung, Taiwan
  • fYear
    2011
  • fDate
    7-9 Nov. 2011
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    The resistance switching behavior has been reported in various materials, including perovskite oxides, transition metal oxides, organics, etc. Among these materials, it is interesting to investigate the RRAMs device based on high-k materials, which are appropriate to integration with CMOS process in the future. Samarium oxide (Sm2O3) is one of important rare earth oxide materials. It has been investigated as high-k materials to substitute SiO2 in CMOS device. Hence, this study investigates a sputtered Sm2O3 thin film to apply into a resistive random access memory device. The proposed device exhibits a stable resistance ratio after 104 cycling bias pulses and no degradation for retention characteristics monitored after an endurance test at 30°C.
  • Keywords
    CMOS memory circuits; high-k dielectric thin films; random-access storage; samarium compounds; switching circuits; CMOS process; RRAM device; Sm2O3; high-k materials; memory devices; perovskite oxides; rare earth oxide materials; resistive random access memory device; resistive switching property; sputtered thin film; temperature 30 degC; transition metal oxides; Films; High K dielectric materials; Ions; Resistance; Switches; Tin; RRAM; Sm2O3 thin film; nonvolatile memory; resistance switching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Non-Volatile Memory Technology Symposium (NVMTS), 2011 11th Annual
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4577-1428-3
  • Type

    conf

  • DOI
    10.1109/NVMTS.2011.6137094
  • Filename
    6137094