• DocumentCode
    3121704
  • Title

    Novel bipolar TaOx-based Resistive Random Access Memory

  • Author

    Wu, Wenjuan ; Tong, Xin ; Zhao, Rong ; Shi, Luping ; Yang, Hongxin ; Yeo, Yee-Chia

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Nat. Univ. of Singapore (NUS), Singapore, Singapore
  • fYear
    2011
  • fDate
    7-9 Nov. 2011
  • Firstpage
    1
  • Lastpage
    5
  • Abstract
    In this paper, we report a novel Cr/TaOx/Al (top to bottom) Resistive Random Access Memory (RRAM) which works as a bipolar switching device. The RRAM devices have demonstrated excellent memory performance including small magnitude of switching voltages (about 2 V), a tight distribution of Vset and Vreset, low switching current, large off/on resistance ratio R of up to 107, and good retention characteristics (more than 105 s) at high temperature (120°C). Resistance of both states shows little degradation, and retention characteristics can be extrapolated to 10 years. The relationship between active area and resistance at low resistance state is studied and the switching appears to be a local phenomenon which is likely to be of the filament type. Forming gas anneal has an additional positive effect on the device performance parameters, as it leads to smaller magnitude of switching voltages and better uniformity of the resistance in the high resistance state.
  • Keywords
    annealing; bipolar memory circuits; random-access storage; CrTaOxAl; RRAM devices; bipolar resistive random access memory; bipolar switching device; degradation characteristics; device performance parameters; forming gas anneal; low switching current; memory performance; off/on resistance ratio; resistance state; retention characteristics; switching voltages; Annealing; Dielectrics; Electrodes; Performance evaluation; Resistance; Switches; Voltage measurement; RRAM; Resistive Random Access Memory; TaOx; bipolar; filament; forming gas anneal (FGA);
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Non-Volatile Memory Technology Symposium (NVMTS), 2011 11th Annual
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4577-1428-3
  • Type

    conf

  • DOI
    10.1109/NVMTS.2011.6137095
  • Filename
    6137095