• DocumentCode
    3121917
  • Title

    Direct measurement of copper electrochemical deposition process chemistry as a function of bath life

  • Author

    West, Michael J. ; Anderson, Marc R. ; Wang, Qin ; Bailey, Thomas H.

  • Author_Institution
    Metara Inc., Sunnyvale, CA, USA
  • fYear
    2004
  • fDate
    4-6 May 2004
  • Firstpage
    492
  • Lastpage
    497
  • Abstract
    This paper summarizes the use of quantitative mass spectrometry for the direct measurement of inorganic and organic species associated with copper ECD process chemistries. This capability enables real-time direct measurement of changes in suppressor, accelerator and leveler concentration, as well as copper and chloride, as they occur. It also enables the identification and quantitation of the molecular species resulting from breakdown of the organic additives as a copper ECD bath is operated in production. In all cases, organic breakdown species accumulate in the bath, adversely affecting bath quality.
  • Keywords
    additives; copper; electrodeposition; electronics industry; mass spectroscopic chemical analysis; metallic thin films; metallisation; organic compounds; Cu; accelerator concentration; bath life; copper electrochemical deposition; inorganic species; leveler concentration; molecular species; organic additives; organic breakdown species accumulation; quantitative mass spectrometry; real time direct measurement; suppressor concentration; Additives; Chemical analysis; Chemical processes; Chemistry; Copper; Electric breakdown; Mass spectroscopy; Metallization; Metrology; Production;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing, 2004. ASMC '04. IEEE Conference and Workshop
  • Print_ISBN
    0-7803-8312-5
  • Type

    conf

  • DOI
    10.1109/ASMC.2004.1309621
  • Filename
    1309621