Iridium sputtered at varying pressures and target-substrate-distances evaluated for use as stimulation electrode material

Author

Wessling, Boerge ; Van Ooyen, Andre ; Mokwa, Wilfried ; Schnakenberg, Uwe

Author_Institution

Inst. of Mater. in Electr. Eng., RWTH Aachen Univ.

fYear

2006

fDate

Aug. 30 2006-Sept. 3 2006

Firstpage

3353

Lastpage

3356

Abstract

Iridium was sputtered as the top layer of stimulation electrodes. The coatings were varied in their morphology by adjusting the total deposition pressure and the working distance (WD) of target and substrate. It is shown that the resulting different kinds of morphologies have a strong influence on stimulation characteristics. The combination of high working gas pressure and small WD as well as the combination of medium working gas pressure and larger WD yield the best characteristics on macro-sized test electrodes

Keywords

biomedical electrodes; iridium; sputtered coatings; surface morphology; Ir; iridium sputtering; macrosized test electrodes; medical implants; morphology; sputter coatings; stimulation electrode material; target-substrate-distances evaluation; total deposition pressure; working distance; working gas pressure; Atomic layer deposition; Biomedical electrodes; Coatings; Implants; Microstructure; Plasma materials processing; Shadow mapping; Sputtering; Substrates; Surface morphology;

fLanguage

English

Publisher

ieee

Conference_Titel

Engineering in Medicine and Biology Society, 2006. EMBS '06. 28th Annual International Conference of the IEEE

Conference_Location

New York, NY

ISSN

1557-170X

Print_ISBN

1-4244-0032-5

Electronic_ISBN

1557-170X

Type

conf

DOI

10.1109/IEMBS.2006.260541

Filename

4462516