Title :
Iridium sputtered at varying pressures and target-substrate-distances evaluated for use as stimulation electrode material
Author :
Wessling, Boerge ; Van Ooyen, Andre ; Mokwa, Wilfried ; Schnakenberg, Uwe
Author_Institution :
Inst. of Mater. in Electr. Eng., RWTH Aachen Univ.
fDate :
Aug. 30 2006-Sept. 3 2006
Abstract :
Iridium was sputtered as the top layer of stimulation electrodes. The coatings were varied in their morphology by adjusting the total deposition pressure and the working distance (WD) of target and substrate. It is shown that the resulting different kinds of morphologies have a strong influence on stimulation characteristics. The combination of high working gas pressure and small WD as well as the combination of medium working gas pressure and larger WD yield the best characteristics on macro-sized test electrodes
Keywords :
biomedical electrodes; iridium; sputtered coatings; surface morphology; Ir; iridium sputtering; macrosized test electrodes; medical implants; morphology; sputter coatings; stimulation electrode material; target-substrate-distances evaluation; total deposition pressure; working distance; working gas pressure; Atomic layer deposition; Biomedical electrodes; Coatings; Implants; Microstructure; Plasma materials processing; Shadow mapping; Sputtering; Substrates; Surface morphology;
Conference_Titel :
Engineering in Medicine and Biology Society, 2006. EMBS '06. 28th Annual International Conference of the IEEE
Conference_Location :
New York, NY
Print_ISBN :
1-4244-0032-5
Electronic_ISBN :
1557-170X
DOI :
10.1109/IEMBS.2006.260541
