Title :
The dEWMA fault tolerant approach for mixed product run-to-run control
Author :
Zheng, Ying ; Ai, Bing ; Wang, Yanwei ; Zhang, Hong
Author_Institution :
Dept. of Control Sci. & Eng., Huazhong Univ. of Sci. & Technol., Wuhan, China
Abstract :
Semiconductor manufacturing is an industry with high cost. Improvement of production efficiency is always an important goal for manufacturers. Run-to-run control has been widely used in batch manufacturing processes to reduce variations. Threaded EWMA run-to-run control is an important stable control scheme. In this paper mixed products are manufactured in cycles. However, the process outputs will oscillate greatly in the first runs of every cycle if the disturbance follows IMA(1,1) series with deterministic linear drift and the break length of a certain product is large enough. A double EWMA controller is adopted to handle the disturbance and the drift. Furthermore, how to deal with process fault is also considered in this paper. Two kinds of fault - the step and ramp fault are discussed for fault tolerant approach which can reduce the large deviation of output from the target. Simulation study showed that the proposed approaches are effective.
Keywords :
batch production systems; fault tolerance; moving average processes; production control; robust control; semiconductor device manufacture; batch manufacturing process; dEWMA fault tolerant approach; deterministic linear drift; disturbance controller; double EWMA controller; drift controller; exponentially weighted moving average algorithm; mixed product run-to-run control; process fault; product break length; ramp fault; semiconductor manufacturing industry; stable control; step fault; Batch production systems; Costs; Fault tolerance; Industrial electronics; Machine control; Manufacturing industries; Mean square error methods; Process control; Pulp manufacturing; Semiconductor device manufacture;
Conference_Titel :
Industrial Electronics, 2009. ISIE 2009. IEEE International Symposium on
Conference_Location :
Seoul
Print_ISBN :
978-1-4244-4347-5
Electronic_ISBN :
978-1-4244-4349-9
DOI :
10.1109/ISIE.2009.5218253