• DocumentCode
    3124996
  • Title

    The integration of SnO2 thin-film onto micro-hotplate for gas sensor applications

  • Author

    Sheng, Lie-yi ; Chan, Philip C.H. ; Sin, Johny K O

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Hong Kong Univ. of Sci. & Technol., Hong Kong
  • fYear
    1997
  • fDate
    35672
  • Firstpage
    145
  • Lastpage
    148
  • Abstract
    Anisotropic silicon etching techniques have been widely used in various microsensors to create thermally isolated structures or micro-hotplate (MHP). EDP (Ethylene-diamine-pyrocatechol) is one of the most commonly used anisotropic etchants because of its high selectivity of silicon compared to masking materials such as silicon dioxide. To integrate sensor arrays of various types of SnO2 thin-film sensors on the microstructure, we need to find a way to photolithographically pattern the SnO2 thin-film. In this paper we report results from such experiments
  • Keywords
    etching; gas sensors; microsensors; photolithography; semiconductor thin films; tin compounds; EDP; SnO2; SnO2 thin film; anisotropic etching; ethylene-diamine-pyrocatechol; gas sensor; micro-hotplate; microsensor; photolithography; Anisotropic magnetoresistance; Etching; Fabrication; Gas detectors; Microsensors; Microstructure; Resists; Sensor arrays; Silicon; Silicon compounds; Sputtering; Thin film sensors; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1997. Proceedings., 1997 IEEE Hong Kong
  • Print_ISBN
    0-7803-3802-2
  • Type

    conf

  • DOI
    10.1109/HKEDM.1997.642352
  • Filename
    642352
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3124996