DocumentCode :
3125981
Title :
Using Windowed Relative Deviation to Detect Possible Voice Pathology
Author :
Laflen, J. Brandon ; Lazarus, Cathy L. ; Amin, Milan R.
Author_Institution :
Fac. of Otolaryngology, Physiol. & Neurosci., & Math., New York Univ., NY
fYear :
2006
fDate :
Aug. 30 2006-Sept. 3 2006
Firstpage :
3755
Lastpage :
3758
Abstract :
A diagnostic method is presented that provides for analyzing pitch "jitter" in running speech. "Jitter" is typically measured with explicit voice tasks, namely sustained vowel phonation. However, some voice pathologies cannot be detected with sustained phonation. Further, it is not possible to ensure explicit voice productions from certain patients, including pediatric populations. In contrast, windowed relative deviation reports instantaneous pitch "jitter" as well as the overall "jitter" statistic commonly reported. Also, the width of the analysis window is related to the rate of pitch deviation, which provides a unique form of selectivity. Voice productions from a normal adult speaker and from an adult speaker with a known voice pathology were analyzed with this method. Voice productions from the normal speaker exhibited less than 1% pitch deviation during phonetic portions of the signal that were akin to sustained phonation. On the other hand, the speaker with a known pathology exhibited greater than 10% pitch deviation at quasi-periodic intervals within sustained phonation
Keywords :
diseases; medical signal processing; patient diagnosis; signal sampling; speech; statistics; analysis window; desampled signal; diagnostic method; jitter statistics; pitch deviation rate; pitch jitter; sustained phonation; voice pathology detection; voice production; vowel phonation; windowed relative deviation; Cities and towns; Frequency; Jitter; Muscles; Pathology; Production; Signal resolution; Speech analysis; Statistics; USA Councils;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Engineering in Medicine and Biology Society, 2006. EMBS '06. 28th Annual International Conference of the IEEE
Conference_Location :
New York, NY
ISSN :
1557-170X
Print_ISBN :
1-4244-0032-5
Electronic_ISBN :
1557-170X
Type :
conf
DOI :
10.1109/IEMBS.2006.259405
Filename :
4462616
Link To Document :
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