DocumentCode :
3128332
Title :
Visualization of the Short Term Maximum Lyapunov Exponent Topography in the Epileptic Brain
Author :
Mammone, Nadia ; Morabito, Francesco Carlo ; Principe, Jose C.
Author_Institution :
Dept. of Informatics, Math., Electron. & Transp., Univ. of Reggio, Calabria
fYear :
2006
fDate :
Aug. 30 2006-Sept. 3 2006
Firstpage :
4257
Lastpage :
4260
Abstract :
In this paper, a new kind of brain topography is introduced and applied to data from four patients affected by intractable epilepsy. Experience has shown that the short term maximum Lyapunov exponent (STLmax) is a robust parameter when optimized for the dynamical analysis of the electroencephalography (EEG). The objective of this work is to map the spatial distribution of STLmax over time. STLmax is estimated from segments of each channel of long term continuous scalp EEG recordings and a movie of the STLmax segment estimates is created over the head. Movies allow for a simple visualization of which electrodes are related to the highest or lowest chaoticity for the longest time. We found out that the interictal epileptiform activity is related to the highest STLmax level, whereas the focal area is related to low STLmax levels during either the interictal and preictal stages
Keywords :
Lyapunov methods; biomedical electrodes; chaos; data visualisation; diseases; electroencephalography; medical signal processing; neurophysiology; signal classification; brain topography; chaoticity; continuous scalp EEG recordings; data visualization; electrodes; electroencephalography; epileptic brain classification; interictal epileptiform activity; preictal epileptiform activity; short-term maximum Lyapunov exponent; signal classification; spatial distribution; Chaos; Data visualization; Electrodes; Electroencephalography; Epilepsy; Magnetic heads; Motion pictures; Robustness; Scalp; Surfaces;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Engineering in Medicine and Biology Society, 2006. EMBS '06. 28th Annual International Conference of the IEEE
Conference_Location :
New York, NY
ISSN :
1557-170X
Print_ISBN :
1-4244-0032-5
Electronic_ISBN :
1557-170X
Type :
conf
DOI :
10.1109/IEMBS.2006.259431
Filename :
4462741
Link To Document :
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