Title :
Distributed-grating Wavelength Demultiplexer in SOI
Author :
Bisaillon, E. ; Tan, D.T.H. ; Nadeau, M.C. ; Chrostowski, L. ; Kirk, A.G.
Author_Institution :
Dept. of Electr. & Comput. Eng., McGill Univ., Montreal, Que.
Abstract :
A shallow-etched, distributed grating is proposed as a wavelength demultiplexer. Modeling results predict up to 79% efficiency over a 60 nm wavelength range. Device fabrication and measurements are presented
Keywords :
demultiplexing equipment; diffraction gratings; etching; optical communication equipment; optical design techniques; optical fabrication; silicon-on-insulator; wavelength division multiplexing; SOI shallow-etched gratings; device fabrication; distributed-grating device; etched grating demultiplexer; wavelength demultiplexer; Arrayed waveguide gratings; Bragg gratings; Diffraction gratings; Etching; Fabrication; Optical waveguides; Predictive models; Slabs; Testing; Wavelength division multiplexing;
Conference_Titel :
Lasers and Electro-Optics Society, 2006. LEOS 2006. 19th Annual Meeting of the IEEE
Conference_Location :
Montreal, Que.
Print_ISBN :
0-7803-9555-7
Electronic_ISBN :
0-7803-9555-7
DOI :
10.1109/LEOS.2006.279215
