• DocumentCode
    3129465
  • Title

    Effect of passivation opening design on electromigration reliability issue in flip-chip solder joints

  • Author

    Chen, Tzu Yu ; Liang, S.W. ; Chen, Chih

  • Author_Institution
    Dept. of Mater. Sci. & Eng., Nat. Chiao Tong Univ., Hsinchu, Taiwan
  • fYear
    2009
  • fDate
    21-23 Oct. 2009
  • Firstpage
    267
  • Lastpage
    270
  • Abstract
    This study investigates the effect of passivation opening design on electromigration reliability issue in flip-chip solder joints by using statistical analysis. Eutectic SnAg solder joints were used in this study with two different filling condition of polyimide (PI), ie with or without contact opening. The bump height is 50 ¿m. The four point probe method was used to monitor the bump resistance of a specific solder joint with downward election flow, under 0.8 A at 155°C. The failure criteria are defined as the resistances rose to 1.2 times and 2 times of their initial values. In addition, three-dimensional finite element analysis (3D-FEA) was employed to show the distribution of current density, and the different failure modes were also discussed. The solder joints without PI performed longer failure time from the statistical analysis results. In other words, the set without PI shows better reliability than that with PI.
  • Keywords
    finite element analysis; flip-chip devices; solders; statistical analysis; 3D finite element analysis; bump height; bump resistance; current density; electromigration reliability; eutectic SnAg solder joints; failure criteria; flip-chip solder joints; four point probe method; passivation opening design; polyimide; statistical analysis; Condition monitoring; Electromigration; Filling; Flip chip solder joints; Nominations and elections; Passivation; Polyimides; Probes; Soldering; Statistical analysis;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microsystems, Packaging, Assembly and Circuits Technology Conference, 2009. IMPACT 2009. 4th International
  • Conference_Location
    Taipei
  • Print_ISBN
    978-1-4244-4341-3
  • Electronic_ISBN
    978-1-4244-4342-0
  • Type

    conf

  • DOI
    10.1109/IMPACT.2009.5382121
  • Filename
    5382121