DocumentCode
3129530
Title
Novel low offset voltage diode using asymmetric threshold voltage MONOS-FET for next generation devices demanding low voltage operation
Author
Ueno, S. ; Furuta, H. ; Okumura, Y. ; Eimori, T. ; Inoue, Yasuyuki
Author_Institution
ULSI Dev. Center, Mitsubishi Electr. Corp., Hyogo, Japan
fYear
2002
fDate
8-11 Dec. 2002
Firstpage
449
Lastpage
452
Abstract
Novel diode with low offset voltage below 0.6V is proposed by using MONOS FET with asymmetric threshold voltage. Offset voltage of 0.3V can be achieved by suppressing off state current and reverse leakage current. This technique gives promising characteristics for next generation circuits with low voltage operation.
Keywords
MOSFET; characteristics measurement; leakage currents; low-power electronics; semiconductor device measurement; 0.3 to 0.6 V; MOS diodes; asymmetric threshold voltage MONOS-FET; charge pump circuit; low offset voltage diode; low voltage operation; next generation devices; off state current suppression; reverse leakage current suppression; Circuits; Diodes; Electrons; FETs; Leakage current; Low voltage; MONOS devices; Photonic band gap; Threshold voltage; Ultra large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 2002. IEDM '02. International
Conference_Location
San Francisco, CA, USA
Print_ISBN
0-7803-7462-2
Type
conf
DOI
10.1109/IEDM.2002.1175875
Filename
1175875
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