DocumentCode
3130219
Title
Advanced integrated passive device (IPD) low pass filter designs on WLCSP
Author
Chang, Po-Hao ; Chiang, Kevin ; Lai, Yeng-Yuan ; Wang, Yu-Po
Author_Institution
Siliconware Precision Ind. Co., Ltd., Taichung, Taiwan
fYear
2009
fDate
21-23 Oct. 2009
Firstpage
132
Lastpage
135
Abstract
An integrated passive device (IPD) solution is one of the important implementation employing the advanced redistribution layers (RDL) technology to fabricate the design passive components. This paper would demonstrate DCS (GSM-1800) Band low pass filter design by using RDL technology. For the design requirement, the specification of insertion loss (EL) of LPF was required bigger than -0.8 dB, return loss (RL) was less than -20 dB, and the attenuations was smaller than -30 dB at two times and three times harmonic frequencies. For the circuit topology selection, in order to achieve a better electrical performance and gain a smaller pattern size, we consisted of five capacitors and two spiral inductors design to miniaturize and fabricate our prototypes. The measurement results were able to meet our demands and they were shown in below: Insertion Loss (EL): -0.8 dB, Return Loss (RL): -20 dB, Attenuation @ 2F0: < -30 dB, Attenuation @ 3F0: < -40 dB, and Pattern size is 1.6 x 0.5 mm . This paper successfully used RDL technology to demonstrate the IPD low pass filter and achieved miniaturization design for GSM-1800 (DCS) Band applications.
Keywords
UHF filters; UHF integrated circuits; capacitors; inductors; low-pass filters; passive filters; radiotelephony; DCS; GSM-1800; WLCSP; advanced redistribution layer; integrated passive device; low pass filter; spiral inductors; Attenuation; Capacitors; Circuit topology; Distributed control; Frequency; Insertion loss; Integrated circuit technology; Low pass filters; Performance gain; Power harmonic filters;
fLanguage
English
Publisher
ieee
Conference_Titel
Microsystems, Packaging, Assembly and Circuits Technology Conference, 2009. IMPACT 2009. 4th International
Conference_Location
Taipei
Print_ISBN
978-1-4244-4341-3
Electronic_ISBN
978-1-4244-4342-0
Type
conf
DOI
10.1109/IMPACT.2009.5382162
Filename
5382162
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