DocumentCode :
3130740
Title :
Improved intermodulation distortion profile of AlGaN/GaN HEMT at high drain bias voltage
Author :
Nagahara, M. ; Kikkawa, T. ; Adachi, N. ; Tateno, Y. ; Kato, S. ; Yokoyama, M. ; Yokogawa, S. ; Kimura, T. ; Yamaguchi, Y. ; Hara, N. ; Joshin, K.
Author_Institution :
Fujitsu Quantum Devices Ltd., Yamanashi, Japan
fYear :
2002
fDate :
8-11 Dec. 2002
Firstpage :
693
Lastpage :
696
Abstract :
We demonstrate, for the first time, the excellent linearity characteristics of AlGaN/GaN HEMTs at drain bias voltages up to 30 V, class AB operation, at 1.9 GHz. AlGaN/GaN HEMTs with a drain periphery of 1 mm, grown on SiC substrates, exhibit a third-order intermodulation distortion (IM3) of -34.7 dBc for an output power level of 26 dBm, 8 dB back-off from saturation power (Psat), at drain bias voltage of 30 V. Furthermore, we will show the linearity characteristics dependence on Vds and describe that superior linearity profile can be obtained with AlGaN/GaN HEMTs at high drain voltage bias.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; intermodulation distortion; wide band gap semiconductors; 1.9 GHz; 30 V; AlGaN-GaN; AlGaN/GaN HEMT; SiC; SiC substrate; class AB operation; drain bias voltage; intermodulation distortion; linearity; output power; saturation power; Aluminum gallium nitride; Gallium nitride; HEMTs; Impedance; Intermodulation distortion; Linearity; Multiaccess communication; Silicon carbide; Silicon compounds; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2002. IEDM '02. International
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-7462-2
Type :
conf
DOI :
10.1109/IEDM.2002.1175933
Filename :
1175933
Link To Document :
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