• DocumentCode
    3130740
  • Title

    Improved intermodulation distortion profile of AlGaN/GaN HEMT at high drain bias voltage

  • Author

    Nagahara, M. ; Kikkawa, T. ; Adachi, N. ; Tateno, Y. ; Kato, S. ; Yokoyama, M. ; Yokogawa, S. ; Kimura, T. ; Yamaguchi, Y. ; Hara, N. ; Joshin, K.

  • Author_Institution
    Fujitsu Quantum Devices Ltd., Yamanashi, Japan
  • fYear
    2002
  • fDate
    8-11 Dec. 2002
  • Firstpage
    693
  • Lastpage
    696
  • Abstract
    We demonstrate, for the first time, the excellent linearity characteristics of AlGaN/GaN HEMTs at drain bias voltages up to 30 V, class AB operation, at 1.9 GHz. AlGaN/GaN HEMTs with a drain periphery of 1 mm, grown on SiC substrates, exhibit a third-order intermodulation distortion (IM3) of -34.7 dBc for an output power level of 26 dBm, 8 dB back-off from saturation power (Psat), at drain bias voltage of 30 V. Furthermore, we will show the linearity characteristics dependence on Vds and describe that superior linearity profile can be obtained with AlGaN/GaN HEMTs at high drain voltage bias.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; intermodulation distortion; wide band gap semiconductors; 1.9 GHz; 30 V; AlGaN-GaN; AlGaN/GaN HEMT; SiC; SiC substrate; class AB operation; drain bias voltage; intermodulation distortion; linearity; output power; saturation power; Aluminum gallium nitride; Gallium nitride; HEMTs; Impedance; Intermodulation distortion; Linearity; Multiaccess communication; Silicon carbide; Silicon compounds; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2002. IEDM '02. International
  • Conference_Location
    San Francisco, CA, USA
  • Print_ISBN
    0-7803-7462-2
  • Type

    conf

  • DOI
    10.1109/IEDM.2002.1175933
  • Filename
    1175933