• DocumentCode
    3130893
  • Title

    Vapor chamber in high performance server

  • Author

    Wang, Jung-Chang ; Chen, Teng-Chieh

  • Author_Institution
    Dept. of Marine Eng., Nat. Taiwan Ocean Univ., Keelung, Taiwan
  • fYear
    2009
  • fDate
    21-23 Oct. 2009
  • Firstpage
    364
  • Lastpage
    367
  • Abstract
    This article describes how to evaluate the thermal-performance of vapor chamber-based thermal module, which has existed in the thermal-module industry for a year or so especially in server application. Thermal-performance of the thermal module with the vapor chamber can be determined within several seconds by using the final formula associated with thermal-performance experimental method deduced in this paper. From the results, the thermal performance of the vapor chamber thermal module is times than that of pure copper base plate. And its thermal performance is closely relate to its dimensions and heat-source flux, in the case of small-area vapor chamber and small heat-source flux, the thermal performance will be less than that of pure copper material. The maximum heat flux of the vapor chamber is over 800,000 W/m2, its thermal performance will increase with input power increasing, and the calculating error is no more than ±3%.
  • Keywords
    thermal conductivity; thermal management (packaging); thermal resistance; high performance server; thermal module; vapor chamber; Copper; Dimensional Analysis; Vapor Chamber;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microsystems, Packaging, Assembly and Circuits Technology Conference, 2009. IMPACT 2009. 4th International
  • Conference_Location
    Taipei
  • Print_ISBN
    978-1-4244-4341-3
  • Electronic_ISBN
    978-1-4244-4342-0
  • Type

    conf

  • DOI
    10.1109/IMPACT.2009.5382193
  • Filename
    5382193