Title :
Effect of (GaP)m/(InP)m short period binary superlattice period on quantum wire formation by strain induced lateral layer ordering in GaInP/AlInP multi-quantum-wire lasers
Author :
Yoshida, Junji ; Kikuchi, Akihiko ; Nomura, Ichirou ; Kishino, Katsumi
Author_Institution :
Dept. of Electr. & Electron. Eng., Sophia Univ., Tokyo, Japan
Abstract :
Optical anisotropy of the GaInP/AlInP compressively strained multi-quantum wire lasers fabricated by the strain induced lateral layer ordering process in (GaP)m(InP)m short period binary superlattice layers, which is a very effective method to fabricate GaInP/AlInP compressively strained quantum wire lasers through gas source molecular beam epitaxy, was investigated systematically by changing (GaP)m/(InP), superlattice period (i.e. monolayer number m). A drastic reduction in threshold current density (Jth ) was obtained at m of 1.5 and anisotropic lasing characteristics were intensified with increasing m values. Moreover the low Jth value of 278A/cm2 was obtained at m of 1.5 ML with a cavity length of 794 μm
Keywords :
III-V semiconductors; aluminium compounds; chemical beam epitaxial growth; current density; gallium compounds; indium compounds; quantum well lasers; semiconductor growth; semiconductor quantum wires; semiconductor superlattices; (GaP)m/(InP)m short period binary superlattice period; 794 mum; GaInP-AlInP; GaInP/AlInP compressively strained multi-quantum wire lasers; GaInP/AlInP multi-quantum-wire lasers; GaP-InP; anisotropic lasing characteristics; cavity length; gas source molecular beam epitaxy; monolayer number; optical anisotropy; quantum wire formation; strain induced lateral layer ordering; threshold current density; Buffer layers; Electroluminescence; Gallium arsenide; Indium phosphide; Polarization; Quantum well lasers; Substrates; Superlattices; Tellurium; Wire;
Conference_Titel :
Indium Phosphide and Related Materials, 1995. Conference Proceedings., Seventh International Conference on
Conference_Location :
Hokkaido
Print_ISBN :
0-7803-2147-2
DOI :
10.1109/ICIPRM.1995.522068