• DocumentCode
    3132444
  • Title

    Direct electrostatic levitation and propulsion of silicon wafer

  • Author

    Jin, Ju ; Jeon, Jong Up ; Higuchi, Toshiro

  • Author_Institution
    Kanagawa Acad. of Sci. & Technol., Japan
  • Volume
    4
  • fYear
    1996
  • fDate
    6-10 Oct 1996
  • Firstpage
    1994
  • Abstract
    A new type of contact-less wafer manipulator, featuring “direct electrostatic levitation and propulsion of silicon wafer” (DELP-SW), has been successfully developed. The novel aspect of this manipulator is that a silicon wafer can be directly levitated and driven via electrostatic forces. In this paper, a brief review of basic principles is presented. This is followed by a description of the structure of a prototype DELP-SW mechanism, including electrode design, position feedback control method, driving principle and the operational procedure. Experimental results which demonstrate completely contact-less transportation of an 8-inch silicon wafer are also presented
  • Keywords
    electric propulsion; electrodes; electronic equipment manufacture; electrostatic devices; electrostatics; feedback; materials handling; position control; semiconductor technology; 8 in; contact-less wafer manipulator; direct electrostatic levitation; direct electrostatic propulsion; driving principle; electrode design; electrostatic forces; operational procedure; position feedback control method; silicon wafer; Electrodes; Electrostatic levitation; Glass; Magnetic levitation; Propulsion; Semiconductor materials; Silicon; Surface contamination; Surface discharges; Transportation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Industry Applications Conference, 1996. Thirty-First IAS Annual Meeting, IAS '96., Conference Record of the 1996 IEEE
  • Conference_Location
    San Diego, CA
  • ISSN
    0197-2618
  • Print_ISBN
    0-7803-3544-9
  • Type

    conf

  • DOI
    10.1109/IAS.1996.563848
  • Filename
    563848