DocumentCode :
3133000
Title :
Lateral modulation in strain-compensated MQW structures
Author :
Shimose, Y. ; Kikugawa, T. ; Nagai, Arid H.
Author_Institution :
Res. Lab., Anritsu Corp., Kanagawa, Japan
fYear :
1995
fDate :
9-13 May 1995
Firstpage :
210
Lastpage :
212
Abstract :
Strain-compensated multiple-quantum-well structures in InGaAsP alloys have been grown by metal-organic vapor-phase epitaxy (MOVPE). Remarkably-periodic lateral-modulated structures have been observed, and their modulation properties are discussed. The modulated structures are enhanced at the InP-rich region and under huge net strain. The modulation period depends on the growth rate
Keywords :
III-V semiconductors; gallium arsenide; gallium compounds; indium compounds; interface structure; internal stresses; semiconductor growth; semiconductor quantum wells; semiconductor superlattices; vapour phase epitaxial growth; InGaAsP; InGaAsP alloys; InP-rich region; MOVPE; growth rate; lateral modulation; metal-organic vapor-phase epitaxy; modulation period; modulation properties; periodic lateral-modulated structures; strain-compensated MQW structures; strain-compensated multiple-quantum-well structures; Ash; Capacitive sensors; Epitaxial growth; Epitaxial layers; Indium phosphide; Lattices; Luminescence; Photoluminescence; Photonic band gap; Quantum well devices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1995. Conference Proceedings., Seventh International Conference on
Conference_Location :
Hokkaido
Print_ISBN :
0-7803-2147-2
Type :
conf
DOI :
10.1109/ICIPRM.1995.522116
Filename :
522116
Link To Document :
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