Title :
Chemical structure of InP surface in MOVPE studied by surface photo-absorption
Author :
Kobayashi, Yoshiyuki ; Kobayashi, Nao
Author_Institution :
NTT Basic Res. Labs., Musashino
Abstract :
Using surface photo-absorption (SPA) spectra, we established a surface phase diagram of P-stabilized (001) InP metalorganic vapor phase epitaxy as a function of substrate temperature and PH3 partial pressure. At 550°C and PH3 partial pressure of 10 and 30 Pa, the surface is (2×4)-like whose P dimers have a bond axis parallel to [1¯10]. As the substrate temperature decreases and the PH3 partial pressure increases, the surface changes to an excess-P surface due to P excessively adsorbing onto (2×4)-like surface without cleaving the P dimer bond. A c(4×4)-like surface was not observed. Furthermore, we found that a suppression of excessive P adsorption is needed to obtain a high quality InP epitaxial layer by minimizing native defects that might form
Keywords :
III-V semiconductors; adsorption; crystal defects; indium compounds; modulation spectra; phase diagrams; semiconductor growth; surface phase transformations; surface structure; vapour phase epitaxial growth; (2×4)-like surface; 10 to 30 Pa; 550 C; InP; InP surface; MOVPE; P adsorption; P dimers; P-stabilized (001)InP metalorganic vapor phase epitaxy; PH3 partial pressure; bond axis; chemical structure; excess-P surface; high quality InP epitaxial layer; native defects; spectra; substrate temperature; surface phase diagram; surface photo-absorption; Anisotropic magnetoresistance; Battery charge measurement; Electric variables measurement; Frequency measurement; Hall effect; Indium compounds; Indium gallium arsenide; Indium phosphide; Noise measurement; Voltage;
Conference_Titel :
Indium Phosphide and Related Materials, 1995. Conference Proceedings., Seventh International Conference on
Conference_Location :
Hokkaido
Print_ISBN :
0-7803-2147-2
DOI :
10.1109/ICIPRM.1995.522118