Title :
Emissivity independent heating of 3D patterns
Author :
Vanormelingen, K. ; Granneman, E.H.A. ; Terhorst, H. ; Rosseel, E. ; Verheyden, K.
Author_Institution :
ASM Belgium, Leuven
Abstract :
It has been shown that for radiative heating systems, 3D patterns have a strong influence on local wafer temperatures during anneal. Since the temperature gradients on the wafer increase with increasing heat up rates and aspect ratios, the importance of these effects is expected to grow when changing to future technology nodes. For conductive heating systems the effect of the 3D patterns is negligible.
Keywords :
annealing; emissivity; semiconductor technology; 3D heating patterns; conductive heating; die emissivity; radiative heating; size 300 mm; wafer temperature; Absorption; Annealing; Europe; Heating; Implants; Lamps; Optical films; Optical sensors; Surface topography; Temperature sensors;
Conference_Titel :
Junction Technology, 2007 International Workshop on
Conference_Location :
Kyoto
Print_ISBN :
1-4244-1103-3
Electronic_ISBN :
1-4244-1104-1
DOI :
10.1109/IWJT.2007.4279969
