DocumentCode :
3133687
Title :
Reduction of inelastic scattering effect by introducing strain-compensated superlattice into GaInAs/GaInP multi-quantum barriers
Author :
Loh, Terhoe ; Miyamoto, Tomoyuki ; Kurita, Youichiro ; Koyama, Fumio ; Iga, Kenichi
Author_Institution :
Precision & Intell. Lab., Tokyo Inst. of Technol., Japan
fYear :
1995
fDate :
9-13 May 1995
Firstpage :
373
Lastpage :
376
Abstract :
The effect of inelastic scattering on the electron reflection in multi-quantum barriers has been examined for the first time by using the damped resonant tunneling model. The electron reflectivity deteriorates below unity most significantly at discrete energies in the virtual barrier. The largest dip in reflectivity is about 15% for intraband relaxation time of 0.16 ps. It is also shown that this deterioration can be reduced by utilizing strain-compensated superlattice in the multi-quantum barriers
Keywords :
III-V semiconductors; electron relaxation time; gallium arsenide; gallium compounds; indium compounds; interface states; quantum interference phenomena; semiconductor superlattices; surface scattering; tunnelling; 0.16 ps; GaInAs-GaInP; GaInAs/GaInP multi-quantum barriers; damped resonant tunneling model; electron reflection; electron reflectivity; inelastic scattering effect; intraband relaxation time; reflectivity; strain-compensated superlattice; virtual barrier; Electrons; Indium phosphide; Optical scattering; Particle scattering; Quantum well lasers; Reflectivity; Resonance light scattering; Resonant tunneling devices; Semiconductor lasers; Superlattices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1995. Conference Proceedings., Seventh International Conference on
Conference_Location :
Hokkaido
Print_ISBN :
0-7803-2147-2
Type :
conf
DOI :
10.1109/ICIPRM.1995.522157
Filename :
522157
Link To Document :
بازگشت