DocumentCode :
3134180
Title :
High electron mobility in heavily doped bases of InP/GaInAs HBTs
Author :
Betser, Y. ; Ritter, D.
Author_Institution :
Dept. of Electr. Eng., Technion-Israel Inst. of Technol., Haifa, Israel
fYear :
1995
fDate :
9-13 May 1995
Firstpage :
452
Lastpage :
455
Abstract :
The minority carrier electron mobility in the base of InP/GaInAs HBTs was measured as a function of temperature using a new magneto transport method. At room temperature the mobility was found to be as high as 3400 cm2 V-1 sec-1 at a base doping level of 3.4×1019 cm-3. The measured mobility was compared with calculations carried out using the dielectric function formalism. The dominant scattering mechanisms are ionized impurity scattering and coupled LO phonon-plasmon scattering. The calculations correctly predict the high temperature mobility. At low temperatures a Monte Carlo analysis must be performed to model the experimental results because the electron distribution is nonthermal. The momentum relaxation rate strongly depends on the electron energy due to the elastic nature of the coupled LO phonon-plasmon scattering at low electron energy
Keywords :
electron mobility; gallium arsenide; heavily doped semiconductors; heterojunction bipolar transistors; impurity scattering; indium compounds; magnetoresistance; minority carriers; phonon-plasmon interactions; semiconductor device models; InP; InP/GaInAs HBTs; Monte Carlo analysis; coupled LO phonon-plasmon scattering; dielectric function formalism; heavily doped bases; high electron mobility; high temperature mobility; ionized impurity scattering; magneto transport method; minority carrier electron mobility; momentum relaxation rate; nonthermal electron distribution; scattering mechanisms; Dielectric measurements; Doping; Electron mobility; Gain measurement; Impurities; Indium phosphide; Monte Carlo methods; Performance analysis; Scattering; Temperature distribution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1995. Conference Proceedings., Seventh International Conference on
Conference_Location :
Hokkaido
Print_ISBN :
0-7803-2147-2
Type :
conf
DOI :
10.1109/ICIPRM.1995.522177
Filename :
522177
Link To Document :
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