Applying Technique of Sacrificial Layer for the Fabrication of Microfilter

Biochip plays an important role in biotechnology and many scientists also pay a lot of attention on this product. Thus, in this study we used MEMS and sacrificial layer techniques to manufacture the microfilter. It only depends on different development properties of the positive and negative photoresists. The feature size of filtration can be precisely controlled by the thickness of sacrificial layer. The main materials for this study are just photoresists, such as negative photoresist SU-8 and positive photoresists AZ4620 and RP4000. The fabrication process was carried out in the yellow room. Compared with the traditional micromachining methods such as bulk micromanufacturing, surface micromachining and the LIGA process, this proposed design and fabrication of microfilter have many advantages including economical fabrication cost and high yield.