DocumentCode :
3136333
Title :
350% Magneto-impedance ratio in thin-film structures
Author :
Fernandez, E. ; Garcia-Arribas, A. ; Svalov, A.V. ; Kurlyandskaya, G.V. ; Barandiaran, J.M.
Author_Institution :
BCMaterials, Univ. del Pais Vasco, Leioa, Spain
fYear :
2015
fDate :
11-15 May 2015
Firstpage :
1
Lastpage :
1
Abstract :
The Magneto-impedance (MI) effect accounts for the large change of the electrical impedance experienced by soft magnetic materials when a magnetic field modifies its magnetic permeability. MI and related phenomena have been extensively studied in different soft magnetic materials with varied shapes and configurations for a wide range of frequencies. The excellent sensitivity of MI to low magnetic fields is suitable for the development of magnetic microsensors competing in performance with fluxgate magnetometers [1]. Thin film-based MI structures are well suited to fabricate magnetic microsensors using the techniques of the microelectronic industry. Among them, Permalloy (Py) based systems benefits from well-established preparation procedures and enhanced structural stability over amorphous based sensors (important for space applications, for instance). In previous studies we have systematically analyzed the influence of the preparation conditions and the structure on the properties of thin film Py-based multilayers. In this work we determine the optimum combination of magnetic and non-magnetic layers to maximize the MI performance, while maintaining an open flux configuration (Py not enclosing the central non-magnetic conductor), which permits the fabrication of the complete stack of layers in a single process [2]. The resulting configuration was implemented in a series of samples with different lengths and widths prepared by magnetron sputtering and photolithography.
Keywords :
Permalloy; enhanced magnetoresistance; magnetic thin films; photolithography; sputter deposition; Ni81Fe19; Permalloy; magnetic layers; magneto-impedance ratio; magnetron sputtering; nonmagnetic layers; open flux configuration; photolithography; thin-film structures; Amorphous magnetic materials; Magnetic hysteresis; Magnetic multilayers; Magnetosphere; Perpendicular magnetic anisotropy; Soft magnetic materials;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Magnetics Conference (INTERMAG), 2015 IEEE
Conference_Location :
Beijing
Print_ISBN :
978-1-4799-7321-7
Type :
conf
DOI :
10.1109/INTMAG.2015.7157329
Filename :
7157329
Link To Document :
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