• DocumentCode
    3136895
  • Title

    Novel current-blocking laser structures using directly-bonded InP-SiO2-InP

  • Author

    Wada, H. ; Ogawa, Y. ; Kamijoh, T.

  • Author_Institution
    Semicond. Technol. Lab., OKI Electr. Ind., Tokyo, Japan
  • fYear
    1995
  • fDate
    9-13 May 1995
  • Firstpage
    777
  • Lastpage
    780
  • Abstract
    We propose a novel laser structure which uses a SiO2 insulator sandwiched with InP as a current blocking layer. The structure has been successfully fabricated by directly bonding InP to SiO2 . A threshold current density of 1.9 kA/cm2 acid a maximum output power of 60 mW have been achieved for a 1.3-μm InGaAsP laser with a bulk active layer and a 300-μm cavity. This result implies that the leakage current is negligible. The parasitic capacitance has been measured to be 31 pF even for a laser with an area of 300 μm×300 μm
  • Keywords
    III-V semiconductors; capacitance; current density; indium compounds; leakage currents; semiconductor lasers; silicon compounds; wafer bonding; 1.3 mum; 300 mum; 31 pF; 60 mW; InP-SiO2-InP; SiO2 insulator; bulk active layer; cavity; current-blocking laser structures; direct wafer bonding; directly-bonded InP-SiO2-InP; leakage current; maximum output power; parasitic capacitance; threshold current density; Area measurement; Bonding; Capacitance measurement; Indium phosphide; Insulation; Leakage current; Parasitic capacitance; Power generation; Power lasers; Threshold current;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 1995. Conference Proceedings., Seventh International Conference on
  • Conference_Location
    Hokkaido
  • Print_ISBN
    0-7803-2147-2
  • Type

    conf

  • DOI
    10.1109/ICIPRM.1995.522259
  • Filename
    522259